High-filling-fraction inverted ZnS opals fabricated by atomic layer deposition
نویسندگان
چکیده
The infiltration of three-dimensional opal structures has been investigated by atomic layer deposition. Demonstrations using ZnS:Mn show that filling fractions .95% can be achieved and that the infiltrated material is of high-quality crystalline material as assessed by photoluminescence measurements. These results demonstrate a flexible and practical pathway to attaining high-performance photonic crystal structures and optical microcavities. © 2003 American Institute of Physics. @DOI: 10.1063/1.1609240#
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تاریخ انتشار 2003